UV-IRRADIATION AND THERMAL-ANNEALING STUDIES IN AMORPHOUS HYDROGENATED BORON-NITRIDE THIN-FILMS

Citation
Im. Brown et al., UV-IRRADIATION AND THERMAL-ANNEALING STUDIES IN AMORPHOUS HYDROGENATED BORON-NITRIDE THIN-FILMS, Physical review. B, Condensed matter, 56(3), 1997, pp. 994-996
Citations number
6
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
56
Issue
3
Year of publication
1997
Pages
994 - 996
Database
ISI
SICI code
0163-1829(1997)56:3<994:UATSIA>2.0.ZU;2-B
Abstract
Both photoproduction and photobleaching of dangling bonds by uv irradi ation and thermal annealing were observed by electron spin resonance ( ESR) in amorphous hydrogenated boron nitride. A model involving long-r ange hydrogen diffusion and hydrogen evolution is proposed to account for the ESR spectral line shapes observed after UV irradiation and the rmal annealing. A Gaussian distribution of activation energies for the long-range hydrogen diffusion was used to explain the observed decrea se in spin susceptibility after thermal annealing. A best fit to the s pin susceptibility data gave an average activation energy of 0.0475 eV and a half-width of this Gaussian distribution of 0.027 eV.