The photochemical equations describing O-3 formation in the lower troposphe
re contain 2 major sink terms for free radicals; combination reactions and
reactions with NOx. Knowing the fraction of radicals removed by reactions w
ith NOx, termed L-N/Q, allows one to predict the sensitivity of O-3 product
ion to NO and VOCs. We derive an analytic formula that gives L-N/Q in terms
of readily measured O-3 precursors and test this formula using constrained
steady state calculations based on field observations gathered in Phoenix,
Arizona. The formula quantifies well-known results regarding the effects o
f dilution, oxidation, and the production of oxidants on the transition fro
m VOC to NOx sensitive behavior as an air parcel is advected away from an u
rban source.