Adsorption of hydrogen on clean and potassium modified low index copper surfaces: Cu(100) and Cu(110)

Citation
L. Thomsen et al., Adsorption of hydrogen on clean and potassium modified low index copper surfaces: Cu(100) and Cu(110), J VAC SCI A, 19(4), 2001, pp. 1988-1992
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
19
Issue
4
Year of publication
2001
Part
2
Pages
1988 - 1992
Database
ISI
SICI code
0734-2101(200107/08)19:4<1988:AOHOCA>2.0.ZU;2-M
Abstract
The adsorption of atomic hydrogen has been studied on clean and potassium m odified Cu(110) and Cu(100) surfaces. Two hydrogen induced states in the va lence band have been found on the clean Cu(110) surface, an a state recedin g in the subsurface and a beta state in the surface of the crystal. Upon an nealing, hydrogen in the subsurface both diffuses to the surface and desorb s at 330 K, and diffuses into the bulk. Two states, alpha (K) and beta (K), have also been observed on the potassium modified surfaces, with the aK st ate assigned to a potassium-hydrogen bond and the alpha (K) state assigned to a Cu-hydrogen bond. The Cu(110) surface is significantly more reactive t han the Cu(100) surface. (C) 2001 American Vacuum Society.