Ion energy distributions in a pulsed, electron beam-generated plasma

Citation
Sg. Walton et al., Ion energy distributions in a pulsed, electron beam-generated plasma, J VAC SCI A, 19(4), 2001, pp. 1325-1329
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
19
Issue
4
Year of publication
2001
Part
1
Pages
1325 - 1329
Database
ISI
SICI code
0734-2101(200107/08)19:4<1325:IEDIAP>2.0.ZU;2-D
Abstract
In this work, we investigate the ion flux at a grounded electrode located a djacent to a pulsed, argon plasma generated by a high-energy electron beam. The plasmas, produced in 100 mTorr, are characterized by high plasma densi ties (> 10(11) cm(-3)) and low electron temperatures (< 1.5 eV). An energy selective mass spectrometer was used to measure temporally resolved ion kin etic-energy distributions at the electrode surface. In addition, ion energy distributions are presented for various electrode locations. The ion energ y distributions correlate well with Langmuir probe measurements of the plas ma potential. (C) 2001 American Vacuum Society.