Modelling sublimation and atomic layer epitaxy in the presence of competing surface reconstructions

Authors
Citation
M. Ahr et M. Biehl, Modelling sublimation and atomic layer epitaxy in the presence of competing surface reconstructions, SURF SCI, 488(1-2), 2001, pp. L553-L560
Citations number
15
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
488
Issue
1-2
Year of publication
2001
Pages
L553 - L560
Database
ISI
SICI code
0039-6028(20010801)488:1-2<L553:MSAALE>2.0.ZU;2-R
Abstract
We present a solid-on-solid model of a binary AB compound, where atoms of t ype A in the topmost layer interact via anisotropic interactions different from those inside the bulk. Depending on temperature and particle flux, thi s model displays surface reconstructions similar to those of (001) surfaces of II-VI semiconductors. We show, that our model qualitatively reproduces many of the characteristic features of these materials which have been obse rved during sublimation and atomic layer epitaxy. We predict some previousl y unknown effects which might be observed experimentally. (C) 2001 Elsevier Science B.V. All rights reserved.