Growth morphology in the Co/Cu(001) system

Growth morphology in Co/Cu/Co films deposited on stepped Cu(001) is investi gated by reflection high-energy electron diffraction (RHEED) and magneto-op tical Kerr effect. The interlayer Cu film thickness is varied from fraction s of a monolayer to several monolayers in order to determine the influence of Cu island nucleation on subsequent Co growth. From the analysis of the o scillations in RHEED intensity and in the uniaxial step anisotropy a growth model is proposed which extends earlier scanning tunneling microscopy obse rvations. The different role of Co atoms at island edges as compared to tho se at pre-existing steps is elucidated. (C) 2001 Elsevier Science Ltd. All rights reserved.