Citation
S. Liu et al., Study on a method of the thickness measurement of ultra-thin PtSi film, ACT PHY C E, 50(8), 2001, pp. 1447-1450
Citations number
11
Categorie Soggetti
Physics
Journal title
ACTA PHYSICA SINICA
ISSN journal
10003290
→ ACNP
Volume
50
Issue
8
Year of publication
2001
Pages
1447 - 1450
Database
ISI
SICI code
1000-3290(200108)50:8<1447:SOAMOT>2.0.ZU;2-I
Abstract
Based on X-ray photoelectron spectrum intensity measurements of thin film b
y ARXPS, a method of determination of the thickness of PtSi ultra-thin film
s through calculations of electrom mean free path I is described in this ar
ticle. The result of calculation is in agreement with that of the TEM cryst
al lattice images analysis. It shows that the method is convenient and can
be used to determine the thickness of other ultra-thin films.