Formation of conical microstructures upon laser evaporation of solids

Citation
Si. Dolgaev et al., Formation of conical microstructures upon laser evaporation of solids, APPL PHYS A, 73(2), 2001, pp. 177-181
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
73
Issue
2
Year of publication
2001
Pages
177 - 181
Database
ISI
SICI code
0947-8396(200108)73:2<177:FOCMUL>2.0.ZU;2-I
Abstract
The formation and development of the large-scale periodic structures on a s ingle crystal Si surface are studied upon its evaporation by pulsed radiati on of a copper vapor laser (wavelength of 510.6 nm, pulse duration of 20 ns ). The development of structures occurs at a high number of laser shots (si milar to 10(4)) at laser fluence of 1-2 J/cm(2) below optical breakdown in a wide pressure range of surrounding atmosphere from 1 to 10(5) Pa. The str uctures are cones with angles of 20-25 degrees, which grow towards the lase r beam and protrude above the initial surface for 20-30 mum. It is suggeste d that the spatial period of the structures (10-20 mum) is determined by th e capillary waves period on the molten surface. The X-ray diffractometry re veals that the modified area of the Si substrate has a polycrystalline stru cture and consists of Si nanoparticles with a size of 40-70 nm, depending o n the pressure of surrounding gas. Similar structures are also observed on Ge and Ti.