Surface photovoltage spectroscopy characterization of a GaAlAs/InGaAs/GaAspseudomorphic high electron mobility transistor structure

Citation
Yt. Cheng et al., Surface photovoltage spectroscopy characterization of a GaAlAs/InGaAs/GaAspseudomorphic high electron mobility transistor structure, APPL PHYS L, 79(7), 2001, pp. 949-951
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
7
Year of publication
2001
Pages
949 - 951
Database
ISI
SICI code
0003-6951(20010813)79:7<949:SPSCOA>2.0.ZU;2-J
Abstract
Using room-temperature surface photovoltage spectroscopy (SPS), we have cha racterized a GaAlAs/InGaAs/GaAs pseudomorphic high electron mobility transi stor (pHEMT) structure. Signals have been observed from every region of the sample. From a line shape fit to the normalized first derivative of the su rface photovoltage signal with respect to photon energy, the two-dimensiona l electron gas density (N-s) was obtained and found to be in good agreement with Hall measurement. The Al composition and the properties of the GaAs/G aAlAs superlattice buffer layer also were obtained from the SPS spectrum. T he results demonstrate the considerable potential of SPS for the contactles s and nondestructive characterization of pHEMT structures at room temperatu re. (C) 2001 American Institute of Physics.