Synthesis and characterization of nanoscaled and nanostructured carbon containing materials produced by thermal plasma technology

Citation
Hd. Klotz et al., Synthesis and characterization of nanoscaled and nanostructured carbon containing materials produced by thermal plasma technology, APPL SURF S, 179(1-4), 2001, pp. 1-7
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
179
Issue
1-4
Year of publication
2001
Pages
1 - 7
Database
ISI
SICI code
0169-4332(20010716)179:1-4<1:SACONA>2.0.ZU;2-O
Abstract
Single-walled carbon nanotubes (SWNT) and carbon nitride films are synthesi zed by a direct current (dc) are discharge at slightly reduced pressure and by an inductively coupled r.f. plasma (ICP) at atmospheric pressure, respe ctively. By treatment with nitric acid SWNT are purified from by-products a nd characterized by scanning electron microscopy (SEM), high resolution tra nsmission electron microscopy (HRTEM), and Raman spectroscopy. ICP allows t he deposition of carbon nitride films on steel substrate. The deposition of the films creates a relatively strong radial symmetric profile. The struct ure of the films are rather independent of the distance between substrate a nd plasma. Raman, Fourier transform infrared (FTIR), and energy dispersive X-ray (EDX) spectroscopy are used for analyzing the carbon nitride material s. (C) 2001 Elsevier Science B.V. All rights reserved.