Evaluation of AFM tips using nanometer-sized structures induced by ion sputtering

In this study, we report on a process for the fabrication of nanometer-size d surface structures using low-energy Ar+ sputtering of InP surfaces. The d imension of these structures (less than or equal to 100 nm) and the distanc e between them can be tuned by the parameters of the sputter process (sputt er time, ion energy, ion incidence angle, sputter time, and ion current den sity or ion flux, respectively). With the help of surfaces prepared by this way. we have evaluated the influence of the actual AFM tip quality on the measured surface topography. Furthermore, we have shown that the tip qualit y has a strong influence on the surface roughness parameters extracted from the AFM images particularly for surfaces with a low surface roughness (sim ilar to1 nm) as generally obtained by means of thin film technologies. (C) 2001 Elsevier Science B.V. All rights reserved.