Based on a brief review of the traditional surface patterning research, thi
s article introduces the recent progress in the research on surface pattern
ing via molecular self-assembly. Because the size scale of molecular self-a
ssemblies is in the range of 1-100 nm, the method of molecular self-assembl
y can easily lead to the construction of ordered structures in nanometer sc
ale, and thus break through the size limit of traditional lithography. Some
novel ways of molecular self-assembly for surface patterning are particula
rly introduced in this review, including supramolecular architecture at int
erface, chemisorption of dendron thoils, and surface aggregation of bolafor
m amphiphiles. Provided that we know more and more about the basic principl
es governing the surface morphology, it is believed that interfacial molecu
lar assembly would be a very competitive supramolecular technique, and a po
tential application in many fields such as surface property adjustment, org
anic patterned devices, surface molecular recognition, and combinatorial ch
emistry is greatly anticipated.