PREFERENTIAL ORIENTATION OF TITANIUM-DIOXIDE POLYCRYSTALLINE FILMS USING ATMOSPHERIC CVD TECHNIQUE

Crystalline orientation and growth rate of titanium dioxide polycrysta lline films deposited using an air-opened chemical vapor deposition ap paratus were investigated. The deposition rate of the titanium dioxide films depends on the substrate temperature and the vaporizing tempera ture of titanium tetra-isopropoxide, X-ray diffraction analysis reveal ed that the growth orientation of the films was mainly varied With the vaporizing temperature, At relatively low vaporizing temperature, the films were consisted of [001]-oriented columnar crystals grown at a m inimum deposition rate of 4 nm/s, In contrast, [100]- and [211]-orient ed crystallites grew with a maximum deposition rate of 45 nm/s at rela tively high vaporizing temperature, These results suggest that the con centration of reactant, which is strongly dependent upon the vaporizin g temperature, is one of factors which decide the growth rate of each crystal face.