FORMATION OF ELECTRIFIED IMAGES ON CERAMI C SUBSTRATES USING FOCUSED ION-BEAM

A focused ion beam (Ga+-FIB) drawing on a non-conductive ceramic subst rate was investigated for the formation of finely electrified images, The electrified images were formed by using a 30 kV of Ga+-FIB with a drawing pattern equipment, The region irradiated with Ga+ ions on the substrates showed positive surface potential and the decay rate of the surface potential was less than 10% for 2000 s in air. The electrifie d images were in-situ observed with a scanning electron microscope (SE M) at 2.5 kV. The secondary electron images, namely the voltage contra st images, showed dark contrast, This fact indicates that the dark ima ge corresponds to the positively electrified regions on the substrate. The width of the electrified image was 8 mu m. Finely electrified ima ges formed by Ga+-FIB can be applied to the electrostatics processes.