Study of iron nitride thin films deposited by pulsed laser deposition

Citation
M. Gupta et al., Study of iron nitride thin films deposited by pulsed laser deposition, J ALLOY COM, 326(1-2), 2001, pp. 265-269
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ALLOYS AND COMPOUNDS
ISSN journal
09258388 → ACNP
Volume
326
Issue
1-2
Year of publication
2001
Pages
265 - 269
Database
ISI
SICI code
0925-8388(20010809)326:1-2<265:SOINTF>2.0.ZU;2-6
Abstract
Thin films of iron nitrides were deposited by pulsed laser deposition at di fferent nitrogen pressures. Depositions were done both in the presence as w ell as absence of glow-discharge around the substrate. Films deposited with out glow-discharge were essentially ferromagnetic in nature and exhibited a structural evolution from b.c.c.-->b.c.t.-->f.c.c.-->h.c.p.--> orthorhombi c phases as the nitrogen pressure during the deposition increased. As a res ult of glow-discharge during the deposition process, increased nitridation is obtained and formation of new-cubic-type Fe-N phases occur. (C) 2001 Els evier Science BV All rights reserved.