Obtaining TiO2 optical films by reactive ac magnetron sputtering

This paper discusses the conditions for obtaining TiO2 optical films by rea ctive ac magnetron sputtering of a Ti target at an ultrasound frequency. Th e dispersion dependences of the refractive index and the absorption index a re computed, as well as the growth rate of the films. The spectral position of the band edge of the fundamental absorption is measured. The effect of the currents in the magnetron discharge plasma on the optical properties of the films is studied. (C) 2001 The Optical Society of America.