Structural and electrical properties of In2O3/SeO2 thin films for gas-sensing applications

Citation
D. Manno et al., Structural and electrical properties of In2O3/SeO2 thin films for gas-sensing applications, J PHYS D, 34(14), 2001, pp. 2097-2102
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN journal
00223727 → ACNP
Volume
34
Issue
14
Year of publication
2001
Pages
2097 - 2102
Database
ISI
SICI code
0022-3727(20010721)34:14<2097:SAEPOI>2.0.ZU;2-0
Abstract
In this work, we report about the analysis of structural, physical, and gas -sensing properties of a new sensing material made by mixing In2O3 and SeO2 . The In2O3/SeO2 thin films have been obtained by thermal evaporation of In :Se in a 2:1 ratio and subsequent thermal annealing in an oxygen flow. In o rder to investigate the structure and the morphology of the films obtained, high-resolution transmission electron microscopy, small-area electron diff raction, and digital image processing were performed on thermally annealed films. The Hall effect and resistivity measurements of such films have been carefully analysed. In addition, In2O3/SeO2 mixed oxide films were tested in a controlled atmosphere and the electrical conductance changes were meas ured as a function of temperature. The sensing behaviour of such films has been analysed according to an adsor ption kinetic model, which related the conductivity variation to gas concen trations, time exposure, and working temperature.