Development of uniform chitosan thin-film layers on silicon chips

Citation
Fs. Ligler et al., Development of uniform chitosan thin-film layers on silicon chips, LANGMUIR, 17(16), 2001, pp. 5082-5084
Citations number
11
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
17
Issue
16
Year of publication
2001
Pages
5082 - 5084
Database
ISI
SICI code
0743-7463(20010807)17:16<5082:DOUCTL>2.0.ZU;2-R
Abstract
Nature creates selectively refractive materials in butterfly wings and crab shells by alternating layers of chitin with different refractive indices. To mimic this construction, control of both thickness and refractive index of chitosan films is required. Methods were developed for adhering the chit osan layer to glass and silicon, polymerizing the chitosan, stabilizing the chitosan films against environmental changes in temperature and humidity, and depositing a uniform chitosan layer with defined thickness. First, comm ercial chitosan was hydrolyzed to obtain lower molecular weight polymers an d further purified. Then chitosan layers were prepared on clean silicon chi ps pretreated with polyvinyl butyral resin for adhesion. The chitosan solut ion with a polymerizing component and a plasticizer consisted of 2.5% purif ied chitosan/2.5% Resimene/0.25% tetraethylene glycol. Spin-coating at vary ing speeds after an incubation period of 1 h at room temperature produced c hitosan layer thicknesses in the ideal range of 1200-2000 Angstrom. The dif ferent thicknesses were reproducible, with a standard deviation across the film between 3 and 5%. The experimental index of refraction calculated for these layers was 1.59.