Hot electron luminescence of MOS tunnel structures with sub-3 nm oxide laye
r on p-Si is experimentally studied. Radiation spectra are shown to exhibit
thresholds whose positions depend on the initial energy E of injected elec
trons. Simultaneously, a threshold-like increase of the light intensity at
a selected wavelength as a function of E is revealed, and attributed to the
onset of different luminescence mechanisms. (C) 2001 Elsevier Science Ltd.
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