Palladium(II) catalysed silicon-oxygen bond formation versus rearrangementreactions

Citation
A. Purkayastha et Jb. Baruah, Palladium(II) catalysed silicon-oxygen bond formation versus rearrangementreactions, PHOSPHOR SU, 168, 2001, pp. 333-338
Citations number
15
Categorie Soggetti
Inorganic & Nuclear Chemistry
Journal title
PHOSPHORUS SULFUR AND SILICON AND THE RELATED ELEMENTS
ISSN journal
10426507 → ACNP
Volume
168
Year of publication
2001
Pages
333 - 338
Database
ISI
SICI code
1042-6507(2001)168:<333:PCSBFV>2.0.ZU;2-Z
Abstract
Phenylsilane and diphenylsilane undergoes rearrangement reactions by pallad ium catalysts such as Pd(TMEDA)Cl-2, Pd(TEEDA)Cl-2, [Pd(PPh3)](2)CL2 (where TMEDA = tetramethylethylenediamine, TEEDA = tetraethylethylenediamine) at room temperature. However, the reductive Si-O bond forming reaction can be performed on hydrosilanes through competitive paths. The reactions of pheny lsilane and quinonic compounds are catlaysed by Pd(TMEDA)Cl-2 (such as 1,4- benzoquinone, 1,4-napthoquinone) to give siloxanes, backbone of these silox anes which contains rearranged phenylsilane units. The thin films of such o ligomers has plot of resistance vs temperature profile resembling semicondu ctor.