Polycrystalline samples of Ti3SiC2 were oxidized in air in the 900 to
1400 degrees C temperature range. The oxidation was parabolic with par
abolic rate constants, k(p), that increased from 1 x 10(-9) to 1 x 10(
-4) kg(2) m(-4) s(-1) as the temperature increased from 900 to 1400 de
grees C, respectively which yielded an activation energy of 370 +/- 20
kJ/mol. The scale that forms was dense. adhesive. resistant to therma
l cyclings and layered. The outer layer was pure TiO2 (rutile), and th
e inner lager consisted of mixture of SiO2 and TiO2. The results are c
onsistent with a model in which growth of the oxide layer occurs by th
e inward diffusion of oxygen ana the simultaneous outward diffusion of
titanium and carbon. The presence of small volume fractions (approxim
ate to 2%) of TiCx in Ti3SiC2 were found to have a deleterious effect
on the oxidation kinetics.