Chemistry and treatment of III-V semiconductor wastewater

Citation
Jh. Golden et al., Chemistry and treatment of III-V semiconductor wastewater, SOL ST TECH, 44(8), 2001, pp. 79
Citations number
18
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X → ACNP
Volume
44
Issue
8
Year of publication
2001
Database
ISI
SICI code
0038-111X(200108)44:8<79:CATOIS>2.0.ZU;2-J
Abstract
Viable treatment and removal of contaminants from compound semiconductor fa b operations require some familiarity with the aqueous chemistry of III-V e lements (i.e., GaAs) on the periodic table. This knowledge will enable foun dries and fabs to comply with local discharge limits and EPA regulations go verning the semiconductor industry. Waste streams from these operations hav e come under increased scrutiny by local and federal regulatory agencies, e specially in light of the current debate about limits for arsenic.