Viable treatment and removal of contaminants from compound semiconductor fa
b operations require some familiarity with the aqueous chemistry of III-V e
lements (i.e., GaAs) on the periodic table. This knowledge will enable foun
dries and fabs to comply with local discharge limits and EPA regulations go
verning the semiconductor industry. Waste streams from these operations hav
e come under increased scrutiny by local and federal regulatory agencies, e
specially in light of the current debate about limits for arsenic.