Band gap structure and electron emission property of chemical-vapor-deposited diamond films

Citation
Jj. Liu et al., Band gap structure and electron emission property of chemical-vapor-deposited diamond films, SOL ST ELEC, 45(6), 2001, pp. 915-919
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
45
Issue
6
Year of publication
2001
Pages
915 - 919
Database
ISI
SICI code
0038-1101(200106)45:6<915:BGSAEE>2.0.ZU;2-J
Abstract
The structures of the band gap and defect states of chemical-vapor-deposite d diamond films were investigated by photoluminescence spectroscopy, coveri ng wavelength from visible to vacuum ultraviolet (VUV). Band gaps ranging f rom 5.5 to 3.2 eV were measured for natural, polycrystalline, and amorphous diamond films. Low voltage field emissions were obtained from wide band ga p films with band gap states distributed close to the conduction band and e xtended deeply into the band gap. Amorphous diamond film with a narrower ba nd gap could not provide low field emission. (C) 2001 Elsevier Science Ltd. All rights reserved.