The field emission properties of chemical vapor deposition (CVD) diamond th
in films are investigated by measuring the field emission I-V characteristi
cs, the emission site density and the field emitted electron energy distrib
ution. The results are discussed with regard to field emission due to negat
ive electron affinity (NEA) and classical Fowler-Nordheim emission due to g
eometrical field enhancement. The requirements on the diamond films for NEA
mediated field emission are discussed. These requirements are high resisti
vity, low defect density and few grain boundaries. We show that diamond fil
ms matching these requirements are actually bad field emitters. On the othe
r hand we show that the films exhibiting good field emission properties are
just opposed to the above mentioned requirements, they exhibit low resisti
vity, high defect density and many grain boundaries as they are of nanocrys
talline nature. The good emitting CVD diamond films are grown on p-type Si(
100) using plasma enhanced CVD at substrate temperatures around 950 degrees
C and a gas mixture of 5% CH4 in H-2. Using the example of multiwalled carb
on nanotube emitter (MWNT) we show how the emitter work function and the lo
cal field at the emission site can be determined independently by measuring
the field emitted electron energy distribution. For MWNT we find a work fu
nction of 4.9 eV and a local field of 2500 V mum(-1) (for an emission curre
nt of the order of 10 pA). In the case of nanocrystalline CVD diamond emitt
er we find work function values around 6 eV and local electric fields again
of the order of 2500 V mum(-1). The electronic structure of the nanocrysta
lline CVD diamond field emitters is investigated using standard photoemissi
on spectroscopy and simultaneous photoemission and field emission spectrosc
opy. From the presented measurements we can clearly relate the low field el
ectron emission of the investigated nanocrystalline diamond films to classi
cal Fowler-Nordheim tunneling due to local geometrical field enhancement. (
C) 2001 Elsevier Science Ltd. All rights reserved.