EELS study of Rh particle growth on ZrO2 substrate with different deposition conditions

Authors
Lykhach, Y Sotiropoulou, D Thiam, MM Pesicka, J Nehasil, V
Citation
Y. Lykhach et al., EELS study of Rh particle growth on ZrO2 substrate with different deposition conditions, SURF SCI, 482, 2001, pp. 789-796
Citations number
21
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
482
Year of publication
2001
Part
2
Pages
789 - 796
Database
ISI
SICI code
0039-6028(20010620)482:<789:ESORPG>2.0.ZU;2-4
Abstract
Electron energy loss spectroscopy (EELS) and Auger electron spectroscopy (A ES) have been used to monitor the formation of Rh films on ZrO2(100) single crystalline substrates. Rhodium was evaporated step by step at various sub strate temperatures. The surface morphology of the deposited material influ ences EELS spectra, so that the relative metal coverage of the substrate ca n be calculated. The EELS and AES results were compared and the conclusions concerning the deposit morphology were verified by means of transmission e lectron microscopy. (C) 2001 Elsevier Science B.V. All rights reserved.