The lateral variation of solid state reactions at surfaces studied by means of photoemission electron microscopy: formation of titanium silicides

Authors
Schmidt, O Fecher, GH
Citation
O. Schmidt et Gh. Fecher, The lateral variation of solid state reactions at surfaces studied by means of photoemission electron microscopy: formation of titanium silicides, SURF SCI, 482, 2001, pp. 335-340
Citations number
10
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
482
Year of publication
2001
Part
1
Pages
335 - 340
Database
ISI
SICI code
0039-6028(20010620)482:<335:TLVOSS>2.0.ZU;2-X
Abstract
The alloying and oxygen reduction at titanium silicon interfaces were studi ed by means of photoemission microscopy. The microscopic chemical compositi on of the sample surface was characterised by means of imaging X-ray absorp tion. The silicide formation was studied at clean and oxidised silicon subs trates both covered with micron-sized titanium patterns. (C) 2001 Elsevier Science B.V. All rights reserved.