Sodium has been deposited on silica surfaces in vacuum conditions. It has b
een shown by X-ray absorption spectroscopy (XAS) that its behaviour depends
dramatically on the temperature of the substrate. When evaporated on clean
silica surface, sodium diffuses into the bulk of the material with a well
defined chemical environment which involves oxygen, sodium and silicon at d
istances of 2.3. 2.9 and 3.8 Angstrom., respectively. On silica at temperat
ure below 220 K, a metallic sodium film is formed but, upon warming the sam
ple up to room temperature, sodium diffuses readily into the silica substra
te. Finally. XAS at the silicon K-edge demonstrates that a strong modificat
ion of the mid-range order of the silicon in the silica occurs upon the dis
solution of the sodium. (C) 2001 Elsevier Science B.V. All rights reserved.