Intramolecularly sulfur stabilized aluminum and gallium alkyl derivatives

The intramolecularly sulfur stabilized organoaluminum and organogallium com pounds Me2Al(CH2)(3)SEt (1). Me2Ga(CH2)(3)SEt (2), MeClAl(CH2)(3)SEt (3), M eClGa(CH2)(3)SEt (4), Cl2Al(CH2)(3)SEt (5), and Cl2Ga(CH2)(3)SEt (6) are sy nthesized from Me2MCl, MeMCl2, and MCl3 (M = Al, Ga), respectively, and ClM g(CH2)(3)SEt. The reaction of 5 and of 6 with BrMg(CH2)(5)Mg-Br yields (CH2 )(5)Al(CH2)(3)SEt (7) and (CH2)(5)Ga(CH2)(3)SEt (8), respectively. AlCl3 an d GaCl3 react with two as well as three equivalents Of ClMg(CH2)(3)SEt form ing ClAl[(CH2)(3)SEt](2) (9) and ClGa[(CH2)(3)SEt](2) (10) as well as Al[(C H2)(3)SEt](3) (11) and Ga[(CH2)(3)SEt](3) (12), respectively. The compounds were characterized by elemental analyses, mass spectroscopy, H-1, C-13, an d Al-27 NMR investigations as well as 6 by single crystal X-ray structure a nalysis.