Dependence of stresses on grain orientations in thin polycrystalline filmson substrates: an explanation of the relationship between preferred orientations and stresses

Citation
Jm. Zhang et al., Dependence of stresses on grain orientations in thin polycrystalline filmson substrates: an explanation of the relationship between preferred orientations and stresses, APPL SURF S, 180(1-2), 2001, pp. 1-5
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
180
Issue
1-2
Year of publication
2001
Pages
1 - 5
Database
ISI
SICI code
0169-4332(20010801)180:1-2<1:DOSOGO>2.0.ZU;2-Z
Abstract
Several experimental results have showed that the degree of (200) preferred orientation increased with increasing compressive stress, on contrary, the degree of (111) preferred orientation increased with increasing tensile st ress in plane of the film. To explain this relationship between preferred o rientations and stresses, we have made calculations of the stresses in plan e of the film for the various (h k l)-oriented grains in a polycrystalline film composed of the fcc metal Cu, Al, Ag, Au, Ni, Pb and Th, respectively. The results of the calculations showed that, the stresses in,plane of the film depended not only on the grain orientations (h k l), but also on the d irection in the plane of the film excepting in (100)- and (111)-oriented gr ains. They were similar for all fcc metals studied with (100)-oriented, gra ins having the lowest average stress in the plane of the film and the (111) -oriented grains the highest. (C) 2001 Elsevier Science B.V. All rights res erved.