C. Arsene et al., FT-IR product study on the photo-oxidation of dimethyl sulphide in the presence of NOx - temperature dependence, ATMOS ENVIR, 35(22), 2001, pp. 3769-3780
The products of the OH radical-initiated oxidation of dimethyl sulphide (DM
S) have been investigated as a function of temperature (284, 295, and 306 K
) and different initial NOx (NO + NO2) concentrations: initial NO was varie
d between 434 and 2821 ppb and NO2 between 135 and 739 ppb. The experiments
were performed at 1000 mbar total pressure in synthetic air using the phot
olysis of H2O2 as the OH-radical source and FT-IR spectroscopy to monitor r
eactants and products. The major sulphur-containing products identified wer
e SO2, dimethyl sulphoxide (DMSO), dim-ethyl sulphone (DMSO2), methane sulp
honic acid (MSA), methane sulphonyl peroxynitrate (MSPN) and OCS. The varia
tion of the product yields with temperature and NOx concentration are consi
stent with the occurrence of both addition and abstraction channels in OH r
adical-initiated oxidation of DMS. Distinct trends in the yields of the var
ious products have been observed as a function of temperature, initial NOx
conditions and also reaction time as NO is consumed in the system. Increasi
ng the initial NO concentration was found to depress the DMSO, SO2 and OCS
formation yields and enhance those of DMSO2, MSA and MSPN. The yield-time b
ehaviour of DMSO2 is supportive of a formation mechanism involving addition
Of O-2 to a (CH3)(2)S-OH adduct, formed via the addition channel, followed
by sequential reactions with NO and O-2. The mechanisms controlling the co
ncentration-time profiles of the individual products under the present expe
rimental conditions are discussed in detail and consideration is given to p
ossible implications for the photo-oxidation of DMS under ambient condition
s. (C) 2001 Elsevier Science Ltd. All rights reserved.