The application of a vacuum ultraviolet Fourier transform spectrometer andsynchrotron radiation source to measurements of the III epsilon(1,0) band of NO

Citation
J. Rufus et al., The application of a vacuum ultraviolet Fourier transform spectrometer andsynchrotron radiation source to measurements of the III epsilon(1,0) band of NO, J CHEM PHYS, 115(8), 2001, pp. 3719-3723
Citations number
29
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CHEMICAL PHYSICS
ISSN journal
00219606 → ACNP
Volume
115
Issue
8
Year of publication
2001
Pages
3719 - 3723
Database
ISI
SICI code
0021-9606(20010822)115:8<3719:TAOAVU>2.0.ZU;2-8
Abstract
The epsilon (1,0) band of NO was measured at high resolution (0.06 cm(-1)) by the vacuum ultraviolet (VUV) Fourier transform spectrometer from Imperia l College, London, using synchrotron radiation at the Photon Factory, KEK, Japan, as a continuum light source. Such resolution facilitates a line by l ine analysis of the NO epsilon (1,0) band which yields accurate rotational line positions and term values as well as the photoabsorption cross section s. The molecular constants of the D(1) (2) Sigma level are found to be T-0= 55 570.582 +/-0.055 cm(-1), B-v=1.979 66 +/-0.000 19 cm(-1), D-v=(5.8 +/-4. 7)x10(-5)cm(-1), gamma=-0.127 +/-0.008 cm(-1) and gamma (D)=-(1.03 +/-0.04) x10(-3) cm(-1). The sum of the line strengths for all rotational transition s of the NO epsilon (1,0) band is determined as 2.55x10(-15) cm(2) cm(-1), corresponding to a band oscillator strength of 0.002 88 +/-0.000 17. (C) 20 01 American Institute of Physics.