Selective regrowth of semi-insulating iron-doped Ga0.51In0.49P (SI-GaInP:Fe
) and SI-GaAs:Fe around GaAs/AlGaAs mesas by hydride vapor phase epitaxy (H
VPE) has been achieved. A HCl based in-situ cleaning procedure has been use
d to remove aluminum oxide from the etched walls of the mesas. Regrowth con
ducted without proper cleaning results in an irregular interface with voids
. Regrowth morphology aspects are also presented. Our cleaning and regrowth
methods have been used for fabricating GaAs/AlGaAs buried heterostructure
in-plane lasers and vertical-cavity surface-emitting lasers.