Correlation between structural imperfection and giant magnetoresistance inelectrodeposited Co/Cu multilayers

Citation
M. Shima et al., Correlation between structural imperfection and giant magnetoresistance inelectrodeposited Co/Cu multilayers, J ELCHEM SO, 148(8), 2001, pp. C518-C523
Citations number
28
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
148
Issue
8
Year of publication
2001
Pages
C518 - C523
Database
ISI
SICI code
0013-4651(200108)148:8<C518:CBSIAG>2.0.ZU;2-T
Abstract
The effect of structural imperfection on the giant magnetoresistance (GMR) of electrodeposited Co/Cu multilayer films was examined. The Co/Cu multilay ers were grown on (100)-textured Cu seed layers on Si(100). Transmission el ectron microscopy revealed that the epitaxial growth of the Co/Cu multilaye rs results in columnar.-rains with an average width of 40-60 nm. The multil ayer structure is significantly perturbed by grain boundary grooving. The p erturbation gives rise to Strong magnetostatic coupling between neighboring magnetic layers, which overwhelms the desired antiferromagnetic exchange c oupling required for large GMR. (C) 2001 The Electrochemical Society.