M. Shima et al., Correlation between structural imperfection and giant magnetoresistance inelectrodeposited Co/Cu multilayers, J ELCHEM SO, 148(8), 2001, pp. C518-C523
The effect of structural imperfection on the giant magnetoresistance (GMR)
of electrodeposited Co/Cu multilayer films was examined. The Co/Cu multilay
ers were grown on (100)-textured Cu seed layers on Si(100). Transmission el
ectron microscopy revealed that the epitaxial growth of the Co/Cu multilaye
rs results in columnar.-rains with an average width of 40-60 nm. The multil
ayer structure is significantly perturbed by grain boundary grooving. The p
erturbation gives rise to Strong magnetostatic coupling between neighboring
magnetic layers, which overwhelms the desired antiferromagnetic exchange c
oupling required for large GMR. (C) 2001 The Electrochemical Society.