Local deposition of gold on silicon by the scanning electrochemical microscope

Citation
E. Ammann et D. Mandler, Local deposition of gold on silicon by the scanning electrochemical microscope, J ELCHEM SO, 148(8), 2001, pp. C533-C539
Citations number
56
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
148
Issue
8
Year of publication
2001
Pages
C533 - C539
Database
ISI
SICI code
0013-4651(200108)148:8<C533:LDOGOS>2.0.ZU;2-A
Abstract
The scanning electrochemical microscope was applied in the feedback mode to deposit Au microstructures on n-Si(111) and indium-tin oxide. This was acc omplished by the anodic dissolution of An at the microelectrode followed by the subsequent redeposition of the Au on the substrate. The influence of p H, substrate potential, and deposition time on the crystalline nanometer st ructure of the micrometer Au deposits was investigated. The effect of these parameters on deposition could be explained by the band structure of the s ilicon. Moreover, understanding the role played by the different parameters allows depositing predefined nanocrystalline structures. (C) 2001 The Elec trochemical Society.