Piezoelectric effect in RF sputtered ferroelectric thin films

Citation
D. Czekaj et al., Piezoelectric effect in RF sputtered ferroelectric thin films, J EUR CERAM, 21(10-11), 2001, pp. 1609-1613
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
ISSN journal
09552219 → ACNP
Volume
21
Issue
10-11
Year of publication
2001
Pages
1609 - 1613
Database
ISI
SICI code
0955-2219(2001)21:10-11<1609:PEIRSF>2.0.ZU;2-L
Abstract
Thin ferroelectric films of BaTiO3, LiNbO3, and Pb(Zr0.53Ti0.45W0.01Cd0.01) O-3 have been grown on different substrates. Processing conditions for the thin film preparation by RF sputtering were optimised to assure the composi tion transfer between the target and the thin film. Structure of the films was investigated by X-ray diffraction. The basic dielectric and piezoelectr ic properties were studied and the processing-structure perfection-property relationships of oxide thin films have been revealed. The piezoelectric ch arge coefficient d(33) was determined. Self-induced polarisation. of the th in films as well as stress-induced polarisation ascribed to reversible disp lacement of 90 degrees domain walls was taken into account to explain exper imental results. (C) 2001 Elsevier Science Ltd. All rights reserved.