Atomistic understanding of semiconductor gas sensors

Citation
V. Lantto et al., Atomistic understanding of semiconductor gas sensors, J EUR CERAM, 21(10-11), 2001, pp. 1961-1965
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
ISSN journal
09552219 → ACNP
Volume
21
Issue
10-11
Year of publication
2001
Pages
1961 - 1965
Database
ISI
SICI code
0955-2219(2001)21:10-11<1961:AUOSGS>2.0.ZU;2-D
Abstract
Oxide semiconductors form a group of compounds whose specific properties of surfaces and interfaces are used for gas sensing. Our fundamental understa nding of the operation principles of these devices is still insufficient. T he abundance of phenomena on open oxide-semiconductor surfaces at elevated operation temperatures of the sensors is a central reason for the situation , in addition of the effects originating in the electrode-semiconductor con tacts. The exchange of lattice oxygen with the surrounding atmosphere and a possible diffusion of oxygen through oxygen-vacancy donors in n-type oxide s, especially at elevated temperatures, have also strong effects on the beh aviour of semiconductor gas sensors. Atomistic understanding of surfaces is the basis for the understanding of both the receptor and transducer functi ons of semiconductor gas sensors. The rutile structure tin dioxide, SnO2, t ogether with its most stable (110) face is the example material here. Espec ially, we consider the oxygen chemistry at the SnO2 (110) surface together with its connection to dipole layers and band-gap surface states. For examp le, the role of tin (II) ions at the reduced SnO2 (110) surface is discusse d. A "transistor model" is also given to describe the transducing propertie s of semiconductor gas sensors. (C) 2001 Elsevier Science Ltd. All rights r eserved.