DESIGN AND FABRICATION OF MICROMINIATURE DELAY-LINE USING THIN-FILM TECHNOLOGY

This paper describes the fabrication of a miniaturized magnetostrictiv e delay line thin film. A monolithic design has been achieved with the coils and the magnetoelastic element contained onto the same silicon substrate. Such a miniaturized device able to be used as a sensor was fabricated by using a multilayer-like technique. The exciting conducto r, the receiving coil and the magnetostrictive delay line were fabrica ted using a conventional photolithographic technique. In order to use conventional magnetostrictive thin films and Fe-metalloid amorphous th in films as active-magnetoelastic elements, the magnetoelastic propert ies which determine their performance was studied. (C) 1997 Elsevier S cience S.A.