Electrodeposition of niobium and tantalum from their complex anions in
molten chloride-fluoride electrolytes has been studied. The tantalum
concentration in the cathodic reaction products is strictly determined
by the electrochemical deposition parameters because the difference o
f the niobium and tantalum potentials in the electrolytes is relativel
y small compared to the Nb-Al, Nb-Ti, Nb-Zr, Nb-W, and Nb-Mo cells. Lo
w-tantalum cathodic niobium and Nb-Ta alloys with the desired composit
ion can be obtained by varying temperature, cathodic current density,
and Ni and Ta concentrations in the electrolyte.