Firing condition for entire reactions of fluorides with water vapor in metalorganic deposition method using trifluoro acetate

To obtain the YBa2Cu3O7, (YBCO) film on buffered metal tapes, we have to fi re films below 800 degreesC and avoid formation of BaF2 in the films which leads to low J(c) by metalorganic deposition using trifluoroacetate method. By estimating each process condition to reaction rate of fluorides with wa ter vapor in precursor, we can established firing profile for YBCO film on buffered metal substrate at 725 degreesC. With the profile, we can successf ully obtained YBCO film on CeO2/YSZ/hastelloy, which has critical current d ensity (J(c)) of 1.72 MA/cm(2) (77 K, 0 T) and thickness of 1860 Angstrom. (C) 2001 Elsevier Science B.V. All rights reserved.