A new laser plume scanning technique for uniform large area YBa2Cu3O7-x deposition

This paper presents a large-area pulsed laser deposition system for deposit ing YBa2Cu3O7-x (YBCO) thin films on substrates ranging from 1 to over 3 in . in diameter. In this system, the rotating target and the focusing lens ar e allowed to scan synchronously using a computer-controlled stepper motor i n order to obtain uniform film properties over the substrate. We propose a simple method for controlling the compositional and thickness distribution of the films and demonstrated epitaxial YBCO deposition over a 3 in, diamet er Si(100) wafer with Y2O3/yttria-stabilized zirconia (YSZ) buffer layers u sing this new method. (C) 2001 Elsevier Science B.V. All rights reserved.