COMBINATION OF PHOTO AND ATOMIC-FORCE MICROSCOPE LITHOGRAPHIES BY USEOF AN ORGANOSILANE MONOLAYER RESIST

Two lithographies basing different resolutions of micro and nanometer scales have been combined using a single organosilane monolayer as a r esist for both. This monolayer resist was first patterned by irradiati on with deep ultraviolet Light through a photomask. Prior to the secon d patterning by scanning probe lithography; the photopatterned monolay er was observed by an atomic force microscope (AFM) in lateral force m icroscopy (LFM) mode. Since the photodegraded monolayer showed stronge r lateral force than the unirradiated monolayer, the photogenerated pa ttern on the monolayer was clearly imaged. Using this LFM image, the A FM probe was aligned on the photofabricated pattern before drawing add itional patterns by scanning probe lithography.