M. Wraback et al., Time-resolved electroabsorption measurement of the transient electron velocity overshoot in GaN, APPL PHYS L, 79(9), 2001, pp. 1303-1305
A femtosecond time-resolved electroabsorption technique employing an AlGaN/
GaN heterojunction p-i-n diode with a p-type AlGaN window layer and a semit
ransparent p contact has been used to measure the transient electron veloci
ty overshoot in GaN. A peak transient electron velocity of 7.25x10(7) cm/s
within the first 200 fs after photoexcitation has been observed at a field
of 320 kV/cm. The increase in electron transit time across the device with
increasing field beyond 320 kV/cm provides experimental evidence for a nega
tive differential resistivity region of the steady-state velocity-field cha
racteristic in this high field range. (C) 2001 American Institute of Physic
s.