Miniband transport in vertical superlattice field-effect transistors

Citation
Ra. Deutschmann et al., Miniband transport in vertical superlattice field-effect transistors, APPL PHYS L, 79(10), 2001, pp. 1564-1566
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
10
Year of publication
2001
Pages
1564 - 1566
Database
ISI
SICI code
0003-6951(20010903)79:10<1564:MTIVSF>2.0.ZU;2-N
Abstract
We study the nonequilibrium transport of two-dimensional electrons through a periodic potential. Our samples are fabricated using the cleaved-edge ove rgrowth technique to provide a vertical field-effect transistor with an und oped GaAs/AlGaAs superlattice channel orthogonal to the current flow. We fi nd a pronounced negative differential resistance, the magnitude of which in creases with increasing modulation strength. The data are qualitatively con sistent with the Esaki-Tsu transport model in minibands, which we calculate for the given samples. We emphasize the significance of the two-dimensiona lity of the electron system and the gate to inhibit domain formation. Weak features in the source-drain current are attributed to Bloch-phonon resonan ces. (C) 2001 American Institute of Physics.