PREFERENTIAL SPUTTERING EFFECTS IN THE DEPOSITION OF TIAL FILMS BY FILTERED CATHODIC ARC DEPOSITION

Authors
MARTIN PJ BENDAVID A WIELUNSKI LS KATARDJIEV I BERG S
Citation
Pj. Martin et al., PREFERENTIAL SPUTTERING EFFECTS IN THE DEPOSITION OF TIAL FILMS BY FILTERED CATHODIC ARC DEPOSITION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 129(2), 1997, pp. 207-209
Citations number
21
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
129
Issue
2
Year of publication
1997
Pages
207 - 209
Database
ISI
SICI code
0168-583X(1997)129:2<207:PSEITD>2.0.ZU;2-Z
Abstract
A filtered cathodic are deposition method has been used to deposit a r ange of TiAl films from alloy cathodes. The composition of the deposit ed films is dependent upon the negative bias applied to the substrate during deposition. The bias range studied was 0 to -200 V and the nomi nal cathode compositions studied were Ti:AI 75:25, Ti:AI 50:50, and Ti :Al:V 86:10:4 at.%. The decrease in Al content with applied substrate bias was modeled using a binary collision code assuming that (a) both Ti and Al species were energetic and (b) only the Ti species were ener getic. The results indicate that bombardment induced segregation of Al is significant in these studies.