High-speed modulation of 850-nm intracavity contacted shallow implant-apertured vertical-cavity surface-emitting lasers

Citation
G. Dang et al., High-speed modulation of 850-nm intracavity contacted shallow implant-apertured vertical-cavity surface-emitting lasers, IEEE PHOTON, 13(9), 2001, pp. 924-926
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE PHOTONICS TECHNOLOGY LETTERS
ISSN journal
10411135 → ACNP
Volume
13
Issue
9
Year of publication
2001
Pages
924 - 926
Database
ISI
SICI code
1041-1135(200109)13:9<924:HMO8IC>2.0.ZU;2-A
Abstract
GaAs-AlGaAs quantum-well (850 nm) vertical-cavity surface-emitting lasers, with lateral current injection and shallow implanted apertures, show small signal modulation bandwidths of at least 11 GHz and large signal data rates of at least 10 Gb/s. The devices achieved a maximum output power of 2.1 mW , with a threshold current and voltage of 1 mA and 1.71 V, respectively. Th e shallow implantation step provides photolithographically precise aperture formation (using O+ ions), for efficient lateral current injection into th e quantum-well active region of the laser, from intracavity contacts. The d evice aperture was 7 mum in diameter, and the opening in the annular top co ntact was 13 mum in diameter. The optical spectrum showed several transvers e modes.