Electrical current distribution across a metal-insulator-metal structure during bistable switching

Citation
C. Rossel et al., Electrical current distribution across a metal-insulator-metal structure during bistable switching, J APPL PHYS, 90(6), 2001, pp. 2892-2898
Citations number
34
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
6
Year of publication
2001
Pages
2892 - 2898
Database
ISI
SICI code
0021-8979(20010915)90:6<2892:ECDAAM>2.0.ZU;2-K
Abstract
Combining scanning electron microscopy and electron-beam-induced current im aging with transport measurements, it is shown that the current flowing acr oss a two-terminal oxide-based capacitor-like structure is preferentially c onfined in areas localized at defects. As the thin-film device switches bet ween two different resistance states, the distribution and intensity of the current paths, appearing as bright spots, change. This implies that switch ing and memory effects are mainly determined by the conducting properties a long such paths. A model based on the storage and release of charge carrier s within the insulator seems adequate to explain the observed memory effect . (C) 2001 American Institute of Physics.