The experimental analysis of dry laser cleaning efficiency is done for cert
ified spherical particle (SiO2, 5.0, 2.5, 1.0, and 0.5 mum) from different
substrates (Si, Ge, and NiP). The influence of different options (laser wav
elength, incident angle, substrate properties, i.e., type of material, surf
ace roughness, etc.) on the cleaning efficiency is presented in addition to
commonly analyzed options (cleaning efficiency versus laser fluence and pa
rticle size). Found laser cleaning efficiency demonstrates a great sensitiv
ity to some of these options (e.g., laser wavelength, angle of incidence, e
tc.). Partially these effects can be explained within the frame of the micr
oelectronics engineering (MIE) theory of scattering. Other effects (e.g., i
nfluence of roughness) can be explained along the more complex line, relate
d to examination of the problem "particle on the surface" beyond the MIE th
eory. The theory of dry laser cleaning, based on one-dimensional thermal ex
pansion of the substrate, demonstrates a great sensitivity of the cleaning
efficiency on laser pulse shape. For the reasonable pulse shape this theory
yields the threshold fluence by the order of magnitude larger than the exp
erimental one. At the same time the theory, which takes into account the ne
ar-field optical enhancement and three-dimensional thermal expansion effect
s, yields the correct values for threshold. (C) 2001 American Institute of
Physics.