Measurements of the electron energy distribution function in an Ar/CF4 inductively coupled plasma

Citation
Md. Bowden et al., Measurements of the electron energy distribution function in an Ar/CF4 inductively coupled plasma, J APPL PHYS, 90(5), 2001, pp. 2158-2161
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
5
Year of publication
2001
Pages
2158 - 2161
Database
ISI
SICI code
0021-8979(20010901)90:5<2158:MOTEED>2.0.ZU;2-V
Abstract
Measurements of the electron energy distribution function (eedf) of a low-p ressure inductively coupled plasma operated in a mixture of Ar and CF4 are reported. The measurement method was laser Thomson scattering. Extensive te st were performed in order to verify that any perturbations caused by the l aser did not affect the measurements. The eedf was measured for different c oncentrations of CF4 gas, and the results indicated that it was non-Maxwell ian when even small amounts of CF4 gas were present. This dependence was at tributed partially to the effect of electron-molecule vibrational excitatio n collisions. (C) 2001 American Institute of Physics.