Strong impact of x-ray radiation associated with electron beam metallization of diamond devices

Citation
C. Hordequin et al., Strong impact of x-ray radiation associated with electron beam metallization of diamond devices, J APPL PHYS, 90(5), 2001, pp. 2533-2537
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
5
Year of publication
2001
Pages
2533 - 2537
Database
ISI
SICI code
0021-8979(20010901)90:5<2533:SIOXRA>2.0.ZU;2-V
Abstract
Electron-beam evaporation of metal contact is commonly used in the fabricat ion of semiconductor devices. We have observed that device irradiation by x -ray photons, which are generated by electrons striking the metal (titanium or gold) to be evaporated, has a strong impact on the characteristics of d iamond devices used for radiation detection. It results in an improvement o f the detector charge collection efficiency by a factor of 1.5 with respect to nonirradiated devices (standard thermal evaporation). Thermally stimula ted current measurements showed that this effect is related to deep trap fi lling by free carriers generated in diamond by x-ray photons impinging the device during e-beam evaporation. Trap filling results in an increase of th e free carrier drift distance before trapping. Study of contact annealing a nd the thermal stability of trap filling showed that charge detrapping at t emperatures above 200 degreesC annihilates the observed detector sensitivit y improvement. (C) 2001 American Institute of Physics.