Formation, faceting, and interaction behaviors of antiphase boundaries in GaAs thin films

Citation
Nh. Cho et Cb. Carter, Formation, faceting, and interaction behaviors of antiphase boundaries in GaAs thin films, J MATER SCI, 36(17), 2001, pp. 4209-4222
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE
ISSN journal
00222461 → ACNP
Volume
36
Issue
17
Year of publication
2001
Pages
4209 - 4222
Database
ISI
SICI code
0022-2461(200109)36:17<4209:FFAIBO>2.0.ZU;2-N
Abstract
Antiphase boundaries occur in GaAs epilayers grown on (001) Ge substrates b y organometallic vapor-phase epitaxy methods. The formation and structural characteristics of these boundaries were investigated by transmission elect ron microscopy (TEM). Steps with particular heights at the surface of subst rates nucleate antiphase boundaries. The observed faceting behavior of thes e boundaries indicates that energy associated with the presence of antiphas e boundaries is strongly related with the boundary planes, and preservation of the stoichiometry of GaAs appears to play an important role in achievin g a lower energy state at antiphase boundaries. (C) 2001 Kluwer Academic Pu blishers.